Session Details

Session 11: Corrosion & Wear Deposit Coatings

Abstract Number:

87

This paper will introduce a newly developed electrolytic plating ‎process capable of depositing high ‎phosphorous (≥10% P) ‎containing nickel/phosphorous (NiP) alloys at high current densities ‎suitable ‎for high volume production using reel-to-reel plating ‎mode. High-phos NiP deposits ‎provide significant benefits ‎compared to pure nickel barrier layers, including improved ‎corrosion ‎resistance and low/no magnetic properties, suitable for ‎high frequency/5G applications. Such ‎innovative technologies ‎contribute to generate value in electroplating processes for ‎manufacturers.‎

Topics:

Corrosion or Wear Deposits/Coatings
Electronics Surface Finishing

Driving forces of green technology, value generation, and advanced ‎applications in emerging ‎technologies are rapidly changing the ‎technical requirements for electronics finishing. Deposition of ‎nickel-‎phosphorous (NiP) alloys has been done electrolytically for decades, ‎with these deposits ‎generally categorized as low-phos (1-4%P) or ‎mid-phos (5-8%). In electronics surface ‎finishing applications, NiP ‎deposits containing >10% P are desirable for a variety of reasons: (i) ‎‎improved corrosion resistance / enhanced functionality as a barrier ‎layer; (ii) low/no magnetic ‎properties, particularly for high frequency ‎‎(5G) applications. Historically, it has been ‎extremely ‎difficult/impossible to produce high-phosphorous (>10% P) ‎containing NiP deposits, ‎especially at the high current densities ‎required for high volume production using high speed reel-to-‎reel ‎plating mode. This paper will introduce a newly developed process ‎capable of producing high-‎phos (>10% P) deposits at high current ‎densities from a boric-acid free electrolyte. Data will be ‎presented ‎for both the corrosion resistant barrier layer application and the ‎non-magnetic ‎application, from both laboratory studies and ‎production environments.‎