Session Details
Session 11: Corrosion & Wear Deposit Coatings
Abstract Number:
87
This paper will introduce a newly developed electrolytic plating process capable of depositing high phosphorous (≥10% P) containing nickel/phosphorous (NiP) alloys at high current densities suitable for high volume production using reel-to-reel plating mode. High-phos NiP deposits provide significant benefits compared to pure nickel barrier layers, including improved corrosion resistance and low/no magnetic properties, suitable for high frequency/5G applications. Such innovative technologies contribute to generate value in electroplating processes for manufacturers.
Topics:
Corrosion or Wear Deposits/Coatings
Electronics Surface Finishing
Driving forces of green technology, value generation, and advanced applications in emerging technologies are rapidly changing the technical requirements for electronics finishing. Deposition of nickel-phosphorous (NiP) alloys has been done electrolytically for decades, with these deposits generally categorized as low-phos (1-4%P) or mid-phos (5-8%). In electronics surface finishing applications, NiP deposits containing >10% P are desirable for a variety of reasons: (i) improved corrosion resistance / enhanced functionality as a barrier layer; (ii) low/no magnetic properties, particularly for high frequency (5G) applications. Historically, it has been extremely difficult/impossible to produce high-phosphorous (>10% P) containing NiP deposits, especially at the high current densities required for high volume production using high speed reel-to-reel plating mode. This paper will introduce a newly developed process capable of producing high-phos (>10% P) deposits at high current densities from a boric-acid free electrolyte. Data will be presented for both the corrosion resistant barrier layer application and the non-magnetic application, from both laboratory studies and production environments.